The SSDM2019 Organizing Committee appreciates the gracious support of the following foundations, organizations and companies.
* Please click on the logos to view companies websites.
Company for Luncheon Seminar
Luncheon Seminar
( Admission Free )
Luncheon Seminar will be held on September 4 at ES Building 2F, ES024.
The luncheon seminar comes with a lunch box and a pack of tea. A luncheon seminar ticket will be distributed at the registration desk in exchange for your business name card in the following period. The number of the ticket is limited to 100 for the seminar and it will be given on first-come and first-served basis.
You can get a lunch box together with tea in exchange for the ticket at the desk in front of the hall entrance from 15 minutes before the seminar starts.
Notes:
- * Please provide your name, affiliation, and e-mail address on attending the luncheon seminar.
Schedule
Date |
Presented by |
Application (Ticket) Available |
Door Open |
Seminar Time |
9/4 (Wed.) |
Photo electron Soul Inc. Language: English |
9/3 (Tue.), 9/4 (Wed.) Registration Desk |
11:45 |
12:00-12:45 |
For Luncheon Seminar details, please click HERE.
Luncheon Seminar details
Photo electron Soul Inc. - Luncheon Seminar
- Title :
- The next generation electron beam system based on semiconductor photocathode technology
- Presenter :
- Atsushi Koizumi
- Abstract :
- For years, the electron beam has been essential for semiconductor manufacturing tasks, such as inspection and mask writing. However, the technology has not changed over almost 50 years since the high-performance field emitter was developed in the 1970s. In recent years, as technological innovations in the semiconductor industry accelerated much faster than expected, the requirement for further performance improvement of the electron beam also increased significantly. We, Photo electron Soul Inc., provide solutions for performance improvement based on semiconductor photocathode technology. This seminar presents our semiconductor photocathode electron beam system in which all the component technologies such as semiconductor, vacuum, and optics are integrated. Our product enables you to generate a high current electron beam with extremely low energy dispersion. These characteristics improve the throughput of the SEM imaging.
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